For On-site Training Please Call
Energy Award Winner
Design Simulate Analyze
EPCON's Process Innovator simulation interface in SiNET 9 provides Engineering Intelligence™ to solve root cause fluid flow and pressure drop problems at your plant facility.
With EPCON's Engineering Intelligence, pipes and equipment above or below set minimum and maximum deviations from design are colored to directly identify the root cause of low pressures and flows in the system. The new AI is EI - Engineering Intelligence in EPCON's Process Innovator.
Design Process Innovator Diagrams
Learning the patented Process Innovator interface in SiNET 9 is quick and easy. Drag equipment icons from a pallet of over 70 process equipment icons onto the pallet and click and drag between available connection ports to place pipes in the system. SiNET 9’s patented Speed Draw creates an equipment and a connected pipe with just one click.
See it in Action
Simulate Liquid or Gas Systems
Many fluid flow simulators on the market require the purchase of two separate products in order to simulate liquid and gas systems, but not with EPCON's SiNET 9. No matter what stream composition, SiNET 9 can simulate it.
See it in Action
We Engineer the World TM
© 2017 EPCON Software, All Rights Reserved
Powered by the Vaaler award winning Process Innovator, EPCON SiNET is
now even easier to use.
AIChE DIPPr® Database
With the AIChE DIPPr Database, your engineering calculations are based on accurate physical property data for over 2000 components.
New custom icons to help make your Process Innovator Diagram shine.
EPCON Sizing Programs
Perform detailed equipment computations to size pipes, pumps, heat exchangers, control valves, relief valves and flowmeters.
Get access to all of the physical properties available in the DIPPr database to confirm your process simulation results.
Use Speed Draw to create process flow diagrams in half the time and Smart Fittings to intelligently populate your fittings and hand valves.
DIPPr is a registered trademark of AIChE and is used by permission.